发明名称 SILICON SUBSTRATE, SOI SUBSTRATE, AND MOS LOW-POWER AND HIGH-SPEED CIRCUIT FOR TFT
摘要 <p>PROBLEM TO BE SOLVED: To provide a method for achieving both low power and high speed in a transistor circuit. SOLUTION: To achieve an optimum state in standby and operation of a threshold voltage in a transistor, a substrate at the lower section of a gate electrode is changed to the same potential as a source, and forward potential to the source by floating and a bias generation circuit. The example of a CMOS circuit is illustrated. The COMS circuit is composed of automatic substrate bias circuits 123 and 124 for P- and N-channel MOS transistors, respectively.</p>
申请公布号 JP2002198536(A) 申请公布日期 2002.07.12
申请号 JP20000404459 申请日期 2000.12.22
申请人 ANDO YOSHIFUMI 发明人 ANDO YOSHIFUMI
分类号 G02F1/1368;G09G3/20;H01L21/822;H01L21/8238;H01L27/04;H01L27/08;H01L27/092;H01L29/786;H03K19/094;H03K19/0948;(IPC1-7):H01L29/786;H01L21/823;G02F1/136 主分类号 G02F1/1368
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