发明名称 |
SILICON SUBSTRATE, SOI SUBSTRATE, AND MOS LOW-POWER AND HIGH-SPEED CIRCUIT FOR TFT |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide a method for achieving both low power and high speed in a transistor circuit. SOLUTION: To achieve an optimum state in standby and operation of a threshold voltage in a transistor, a substrate at the lower section of a gate electrode is changed to the same potential as a source, and forward potential to the source by floating and a bias generation circuit. The example of a CMOS circuit is illustrated. The COMS circuit is composed of automatic substrate bias circuits 123 and 124 for P- and N-channel MOS transistors, respectively.</p> |
申请公布号 |
JP2002198536(A) |
申请公布日期 |
2002.07.12 |
申请号 |
JP20000404459 |
申请日期 |
2000.12.22 |
申请人 |
ANDO YOSHIFUMI |
发明人 |
ANDO YOSHIFUMI |
分类号 |
G02F1/1368;G09G3/20;H01L21/822;H01L21/8238;H01L27/04;H01L27/08;H01L27/092;H01L29/786;H03K19/094;H03K19/0948;(IPC1-7):H01L29/786;H01L21/823;G02F1/136 |
主分类号 |
G02F1/1368 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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