| 摘要 |
A debris containment shutter useable in a photolithography system comprises one or more moving members that sweep and/or deflect debris that is associated with plasma generated from a target away from the structures to be protected from the debris. The members may be configured as a structure that moves across the plasma space in which the debris populates, such as a rotating or reciprocating structure. For controlling debris associated with pulsed radiation, the movement of the members is synchronized with the pulses of plasma emitted radiation. In one aspect of the present invention, the shutter comprises a plate rotatable about an axis of rotation, the plate defining at least one opening therethrough and at least one member (e.g., in the form of baffles or vanes) extending from a surface of the plate. The members may extend radially outward from a hub or inward from a perimeter. In another aspect of the invention, the shutter includes a manifold which extends at least partially around the perimeter of the members. The manifold preferably defines a volume for collection of debris from a space traversed by the member when the plate is rotated.
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