发明名称 Semiconductor device
摘要 In order that the threshold value of a cell separated from an emitter wire bonding portion (W1, W2) be larger than that of a cell immediately below the emitter wire bonding portion, the area of a diffusion layer (8a) of a cell separated from the wire bonding portion is made larger than that of a diffusion layer (8) for connecting an emitter electrode (2) and a base region (7) in a cell immediately below the wire bonding portion. This allows a hole current to be discharged outside via an emitter wire within a short time period, without adversely affecting the operating characteristics and the steady loss, in a position where this hole current readily remains upon turn-off in a conventional IGBT. This shortens the fall time and reduces the switching loss.
申请公布号 US2002089015(A1) 申请公布日期 2002.07.11
申请号 US20010981870 申请日期 2001.10.19
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 NAKANISHI HIDETOSHI;KOBAYASHI MASAKAZU;CHAKI TOSHIO
分类号 H01L29/78;H01L29/06;H01L29/08;H01L29/10;H01L29/739;(IPC1-7):H01L29/76;H01L31/062;H01L29/94 主分类号 H01L29/78
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