发明名称 Semiconductor device for suppressing detachment of conductive layer and method for manufacturing the semiconductor device
摘要 A semiconductor device and a method for manufacturing the semiconductor device are provided in which a lower plug electrically connected with an active region of a wafer has a recession, and a conductive layer has a projection fitted into the recession of the lower plug, so that a contact area between the lower plug and the conductive layer increases without increasing a contact resistance therebetween. Thus, the conductive layer can endure physical impacts applied in the formation of the conductive layer itself and in subsequent integration processes, without detaching from the lower plug or the wafer.
申请公布号 US2002089061(A1) 申请公布日期 2002.07.11
申请号 US20020054569 申请日期 2002.01.22
申请人 KIM SUNG-BONG;KIM JOO-YOUNG;LIM MIN-HWAN 发明人 KIM SUNG-BONG;KIM JOO-YOUNG;LIM MIN-HWAN
分类号 H01L21/28;H01L21/768;H01L23/485;H01L23/522;H01L23/532;H01L29/78;(IPC1-7):H01L23/48 主分类号 H01L21/28
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