| 发明名称 |
Ammonium salt of organic acid and resist composition containing the same |
| 摘要 |
The present invention provides a novel ammonium salt of an organic acid. When the salt is used as a base additive for a chemically amplified resist, the environmental stability of the resist can be enhanced, and the T-top phenomenon can be effectively prevented. In addition, the line width change caused by acid diffusion can be prevented, and the E0 value of the resist can be decreased.
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| 申请公布号 |
US2002086234(A1) |
申请公布日期 |
2002.07.04 |
| 申请号 |
US20010801742 |
申请日期 |
2001.03.09 |
| 申请人 |
CHANG SHENG-YUEH;CHEN JIAM-HONG;LIU TING-CHUN;LIN TZU-YU;TSAI WEN-YUANG |
发明人 |
CHANG SHENG-YUEH;CHEN JIAM-HONG;LIU TING-CHUN;LIN TZU-YU;TSAI WEN-YUANG |
| 分类号 |
C07C51/41;G03F7/004;G03F7/039;(IPC1-7):G03F7/004;C07D311/02;C07C63/33;C07C62/34 |
主分类号 |
C07C51/41 |
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