发明名称 Protective layer for quartz crucibles used for silicon crystallization
摘要 A thermodynamically stable, protective coating layer is applied by thermal spray technique to the inner and outer surfaces of a quartz crucible used for mono or polycrystalline silicon crystallization processing, inhibiting fusion between the silicon melt and the vitreous silica of the crucible, contamination of the silicon melt by contaminants released from the crucible by devitrification, and any chemical reaction occurring between the crucible and any supporting graphite structure. A powdered form of a suitable protective coating material compatible with high temperature plasma spray techniques, such as magnesium zirconate, barium zirconate, or stabilized zirconium oxide, is fed into a high temperature and high speed plasma jet directed at the crucible. The powder particles are softened or melted in the jet and deposited on the surfaces of the quartz crucible, and allowed to cool and harden into a protective coating.
申请公布号 US2002086119(A1) 申请公布日期 2002.07.04
申请号 US20010944790 申请日期 2001.08.31
申请人 HARIHARAN ALLEPEY V.;CHANDRA MOHAN;COSTANTINI MICHAEL A.;WAN YUEPENG 发明人 HARIHARAN ALLEPEY V.;CHANDRA MOHAN;COSTANTINI MICHAEL A.;WAN YUEPENG
分类号 B29C33/58;C23C4/10;C23C4/12;C30B11/00;C30B15/10;C30B35/00;(IPC1-7):B05D1/08 主分类号 B29C33/58
代理机构 代理人
主权项
地址