| 摘要 |
A photo mask for patterning a lightning rod includes a shorting bar pattern and a plurality of pad patterns, an outer lightning rod pattern connected to the shorting bar pattern, an inner lightning rod pattern connected to the pad pattern, projections from each of the outer and inner lightning rod patterns, and a fine pattern in a "<custom-character file="US20020086219A1-20020704-P00900.TIF" wi="20" he="20" id="custom-character-00001"/>" shape connected between the projections, or a redundancy fine pattern connected between the pad patterns, or a plurality of the lightning rod patterns connected in series, thereby protecting the photo mask for patterning a lightning rod from damage from static electricity, and permitting patterning of an accurate lightning rod.
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