发明名称 Method and apparatus for drying a substrate
摘要 A method and apparatus for drying a disk-shaped substrate. The substrate is typically a substrate used for the manufacture of magnetic disks, and has a centrally located opening. The substrate is lowered into a liquid bath by a first holder, which also becomes immersed in the bath. The first holder lifts the substrate until the substrate extends partially out of contact with the liquid. A second, dry holder grabs a dry portion of the substrate that extends out of the bath, and continues to lift the substrate out of contact with the liquid. In one embodiment, different portions of the substrate are lifted past the surface of the liquid at different speeds
申请公布号 US2002083967(A1) 申请公布日期 2002.07.04
申请号 US20010837536 申请日期 2001.04.17
申请人 ROSANO MICHAEL;ASIF MUHAMMAD;FUNG ROBERT PUI CHI 发明人 ROSANO MICHAEL;ASIF MUHAMMAD;FUNG ROBERT PUI CHI
分类号 G11B5/84;H01L21/00;(IPC1-7):B08B3/04 主分类号 G11B5/84
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