ULTRA HIGH RESOLUTION LITHOGRAPHIC IMAGING AND PRINTING AND DEFECT REDUCTION BY EXPOSURE NEAR THE CRITICAL CONDITION,申请号EP20000919248-传众专利搜索

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发明名称	ULTRA HIGH RESOLUTION LITHOGRAPHIC IMAGING AND PRINTING AND DEFECT REDUCTION BY EXPOSURE NEAR THE CRITICAL CONDITION
摘要
申请公布号	EP1218800(A2)	申请公布日期	2002.07.03
申请号	EP20000919248	申请日期	2000.03.07
申请人	NATIONAL UNIVERSITY OF SINGAPORE	发明人	VLADIMIRSKY, YULI;BOURDILLON, ANTONY
分类号	G03F7/20;H01L21/027;(IPC1-7):G03F7/20	主分类号	G03F7/20
代理机构		代理人
主权项
地址

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