发明名称 ABRASIVE MATERIAL FOR HARD AND BRITTLE MATERIAL SUBSTRATE
摘要 <p>PROBLEM TO BE SOLVED: To provide a lithium tantalate substrate abrasive material of a high polishing rate. SOLUTION: A abrasive material composition comprises (a) 1 to 10 wt.%γ-alumina of BET specific surface 40 to 160 m2/g and 0.5μm in average grain diameter, (b) 10 to 30 wt.% colloidal silica or fumed silica 10 to 100 nm in average grain diameter, (c) 1 to 25 wt.% polyethylene glycol of molecular weight 100 to 400, (d) 0.5 to 5 wt.% dispersing agent, and (e) 30 to 87 wt.% water, is of pH 8.5 to 12.5, and serves as a hard and fragile material substrate abrasive material.</p>
申请公布号 JP2002184726(A) 申请公布日期 2002.06.28
申请号 JP20000385483 申请日期 2000.12.19
申请人 OKAMOTO MACHINE TOOL WORKS LTD 发明人 YAMADA TSUTOMU;KUBO TOMIO
分类号 B24B37/00;C09K3/14;H01L21/304;(IPC1-7):H01L21/304 主分类号 B24B37/00
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