| 摘要 |
PROBLEM TO BE SOLVED: To achieve stable modification effect and to remove deposit in a dry cleaning device using radiation ultraviolet rays due to an excimer lamp. SOLUTION: A dry cleaning device includes an excimer lamp 1 for applying an excimer beam toward a substrate 3, and an air flow direction control mechanism 10 for controlling the direction of air flow between the excimer lamp 1 and the substrate 3.
|
