发明名称 INTRALEVEL DECOUPLING CAPACITOR, METHOD OF MANUFACTURE AND TESTING CIRCUIT OF THE SAME
摘要 A decoupling capacitor is provided for a semiconductor device and may include a first low dielectric insulator layer and a low resistance conductor formed into at least two interdigitized patterns on the surface of the first low dielectric insulator in a single interconnect plane. A high dielectric constant material may be provided between the two patterns. A circuit for testing a plurality of these capacitors is also provided which includes a charge monitoring circuit, a coupling circuit and a control circuit.
申请公布号 US2002081832(A1) 申请公布日期 2002.06.27
申请号 US19990330803 申请日期 1999.06.11
申请人 BERNSTEIN KERRY;BRACCHITTA JOHN A.;COTE WILLIAM J.;NING TAK H.;PRICER WILBUR D. 发明人 BERNSTEIN KERRY;BRACCHITTA JOHN A.;COTE WILLIAM J.;NING TAK H.;PRICER WILBUR D.
分类号 H01L21/02;H01L27/08;(IPC1-7):H01L21/823;H01L21/824;H01L21/476;H01L29/00 主分类号 H01L21/02
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