发明名称 |
Base-pad for a polishing pad |
摘要 |
The invention is directed to a base-pad for placement under a polishing pad for use with a polishing fluid during a polishing operation, the base-pad having a layer with vertical elongated pores that absorb polishing fluid and that confine absorbed polishing fluid from transport laterally in the base-pad. Micropores in the layer are impermeable to the polishing fluid and permeable to gasses.
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申请公布号 |
US2002081946(A1) |
申请公布日期 |
2002.06.27 |
申请号 |
US20010896588 |
申请日期 |
2001.06.29 |
申请人 |
SCOTT DIANE B.;BAKER ARTHUR RICHARD;ZHANG TAO |
发明人 |
SCOTT DIANE B.;BAKER ARTHUR RICHARD;ZHANG TAO |
分类号 |
B24B37/00;B24B37/04;B24B37/22;B24B37/24;B24D11/02;B24D13/12;B24D13/14;H01L21/304;(IPC1-7):B24B1/00;B24B7/19 |
主分类号 |
B24B37/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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