发明名称 |
METHOD FOR MANUFACTURING INTEGRATED TYPE INKJET HEAD |
摘要 |
PURPOSE: A method for manufacturing integrated type inkjet head is provided to achieve improved accuracy by preventing degradation of photoresist and reducing development time of photoresist. CONSTITUTION: A method comprises a first step of forming an actuator(7) for actuating nozzle in a predetermined region of a silicon substrate(5); a second step of forming a photoresist layer by performing or repeatedly performing a photoresist spin coating, tightly attaching a nozzle mask, and exposing the resultant structure to leave a desired thickness; a third step of removing the photoresist reacted through the second process, by a developing process; a fourth step of tightly attaching a chamber mask, and exposing the resultant structure so as to allow photoresist in a predetermined region from among the residual photoresist to react; a fifth step of removing the photoresist reacted through the fourth step, by a developing process; and a sixth step of forming a nozzle and housing by electro forming or SU-8 coating the photoresist remaining through the first to fifth steps, and stripping the photoresist film by a wet process.
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申请公布号 |
KR20020050498(A) |
申请公布日期 |
2002.06.27 |
申请号 |
KR20000079655 |
申请日期 |
2000.12.21 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
JUNG, MYEONG SONG;KIM, TAE GYUN |
分类号 |
B41J2/235;(IPC1-7):B41J2/235 |
主分类号 |
B41J2/235 |
代理机构 |
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