发明名称 METHOD FOR MANUFACTURING INTEGRATED TYPE INKJET HEAD
摘要 PURPOSE: A method for manufacturing integrated type inkjet head is provided to achieve improved accuracy by preventing degradation of photoresist and reducing development time of photoresist. CONSTITUTION: A method comprises a first step of forming an actuator(7) for actuating nozzle in a predetermined region of a silicon substrate(5); a second step of forming a photoresist layer by performing or repeatedly performing a photoresist spin coating, tightly attaching a nozzle mask, and exposing the resultant structure to leave a desired thickness; a third step of removing the photoresist reacted through the second process, by a developing process; a fourth step of tightly attaching a chamber mask, and exposing the resultant structure so as to allow photoresist in a predetermined region from among the residual photoresist to react; a fifth step of removing the photoresist reacted through the fourth step, by a developing process; and a sixth step of forming a nozzle and housing by electro forming or SU-8 coating the photoresist remaining through the first to fifth steps, and stripping the photoresist film by a wet process.
申请公布号 KR20020050498(A) 申请公布日期 2002.06.27
申请号 KR20000079655 申请日期 2000.12.21
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 JUNG, MYEONG SONG;KIM, TAE GYUN
分类号 B41J2/235;(IPC1-7):B41J2/235 主分类号 B41J2/235
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