| 摘要 |
FIELD: machine building. ^ SUBSTANCE: invention can be used in manufacturing of semiconductors, thin films, liquid crystals and other products with thin-film coatings. Shutter housing (2) allows openings, each of which is implemented in side walls directed to each other. Shutter contains gate (3) for opening/closing of openings, cylindrical sliding gate (22), implemented with ability of introduction through opening at the side of working chamber into casing of shutter at opening of gate and free reciprocating motion between them. Receiving element (21) is located in opening at the side of part of electron injector and contact to end part of moving flap (22). Driving facility provides reciprocative transportation of moving flap (22). End part of moving flap (22) and receiving element (21) are reduced close to each other by means of driving facility for providing of sealed separation of internal part of moving flap and internal part of gutter casing from each other. ^ EFFECT: even when vacuum seal for vacuum device, used in the device of vapor-phase sedimentation, is in open position, in chamber of vapor-phase sedimentation it is provided reliability of vacuum keeping by means of protection of internal surface of gutter casing and shutter from vapors of sedimentated from vapor phase of material. ^ 3 cl, 7 dwg |
