发明名称 |
Sputtering method and apparatus with optical monitoring |
摘要 |
<p>In a method of sputtering thin films onto a substrate, the substrate is placed below a sputtering source assembly in a vacuum chamber. A light beam is projected onto the substrate and passes through an optical passage in the sputtering source assembly. In this way, the growth of the sputtered film can be accurately monitored at near normal angles of incidence.</p> |
申请公布号 |
GB2331764(B) |
申请公布日期 |
2002.06.26 |
申请号 |
GB19970025356 |
申请日期 |
1997.12.01 |
申请人 |
* NATIONAL RESEARCH COUNCIL OF CANADA |
发明人 |
BRIAN T * SULLIVAN;GLENN A * CLARKE;NORMAN * OSBORNE;GLENN A * CLARKE |
分类号 |
G01B11/06;C23C14/34;C23C14/35;C23C14/54;H01J37/32;H01J37/34;(IPC1-7):C23C14/54;C23C14/52 |
主分类号 |
G01B11/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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