| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure apparatus which is used for exposure of a plate making process step in a production line to use a belt-like metallic sheet material as a blank and to perform etching by a photoetching process, facilitates fitting a photomasks to frame sections with positioning pins and can assure at least the present state in terms of quality. SOLUTION: The respective frame sections of the both side exposure apparatus for exposing photosensitive resist films from both surfaces of a base material provided with these resist films are provided with the positioning pins or blocks for determining the positions in the vertical direction of the photomasks and hand-over pins for placing the photomasks thereon and handing-over the photomasks between the positioning pins or blocks in the lower parts of the frame sections. The hand-over pins are rotatable around one direction perpendicular to the frame sections of the positions lower than the top surfaces of the positioning pins or blocks and after the photomasks are handed over to the positioning pins by the hand-over pins, the hand-over pins are rotated to prevent the hand-over pins from hindering the tight contact of the photomasks with the base material and thereafter the photomasks is brought into tight contact with both surfaces of the base material and the exposure is performed from both surfaces of the base material.
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