发明名称 |
RADIATION SENSITIVE RESIN COMPOSITION FOR FORMING INSULATION FILM OF ORGANIC EL DISPLAY ELEMENT, INSULATION FILM FORMED FROM THE SAME AND ORGANIC EL DISPLAY ELEMENT |
摘要 |
PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition for forming an insulation film of an organic EL(electroluminescent) element capable of forming a through hole or a U-shaped recess, excellent in flattening performance and having high transparency and high resistance to a resist removing solution and to provide an insulation film of an organic EL element formed from the composition and an organic EL display element with the insulation film. SOLUTION: The composition contains (a) an epoxy-containing alkali-soluble resin and (b) a 1,2-quinonediazido compound. The insulation film is formed from the composition. The organic EL display element has the insulation film. |
申请公布号 |
JP2002182380(A) |
申请公布日期 |
2002.06.26 |
申请号 |
JP20000379680 |
申请日期 |
2000.12.14 |
申请人 |
JSR CORP |
发明人 |
SUZUKI MASAMUTSU;SASAKI HIROBUMI;NISHIMURA ISAO;NIWA KAZUAKI |
分类号 |
G03F7/022;C08K5/28;C08L101/06;G03F7/032;G03F7/038;H01L51/50;H05B33/14;H05B33/22 |
主分类号 |
G03F7/022 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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