发明名称 RADIATION SENSITIVE RESIN COMPOSITION FOR FORMING INSULATION FILM OF ORGANIC EL DISPLAY ELEMENT, INSULATION FILM FORMED FROM THE SAME AND ORGANIC EL DISPLAY ELEMENT
摘要 PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition for forming an insulation film of an organic EL(electroluminescent) element capable of forming a through hole or a U-shaped recess, excellent in flattening performance and having high transparency and high resistance to a resist removing solution and to provide an insulation film of an organic EL element formed from the composition and an organic EL display element with the insulation film. SOLUTION: The composition contains (a) an epoxy-containing alkali-soluble resin and (b) a 1,2-quinonediazido compound. The insulation film is formed from the composition. The organic EL display element has the insulation film.
申请公布号 JP2002182380(A) 申请公布日期 2002.06.26
申请号 JP20000379680 申请日期 2000.12.14
申请人 JSR CORP 发明人 SUZUKI MASAMUTSU;SASAKI HIROBUMI;NISHIMURA ISAO;NIWA KAZUAKI
分类号 G03F7/022;C08K5/28;C08L101/06;G03F7/032;G03F7/038;H01L51/50;H05B33/14;H05B33/22 主分类号 G03F7/022
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