发明名称 Semiconductor device and process of production of same
摘要 A semiconductor device operable with a single positive power source, enabling an increase in efficiency, and improved in high-frequency characteristics by lowering the resistivity of a gate contact, including a carrier run layer formed on a substrate for running of carriers; a carrier supply layer formed on the carrier run layer, having a larger bandgap than the carrier run layer, and containing a first conductivity type impurity; a barrier layer formed on the carrier supply layer and having a smaller bandgap than the carrier supply layer; a source electrode and a drain electrode formed on the barrier layer at a predetermined distance from each other; a gate electrode formed on the barrier layer between the source electrode and the drain electrode away from the source electrode and the drain electrode; and a first low resistivity region formed at least below the gate electrode in the barrier layer and containing a second conductivity type impurity opposite in conductivity to the first conductivity type, and a process of production of the same.
申请公布号 US6410947(B1) 申请公布日期 2002.06.25
申请号 US20000570444 申请日期 2000.05.12
申请人 SONY CORPORATION 发明人 WADA SHINICHI
分类号 H01L29/812;H01L21/285;H01L21/335;H01L21/338;H01L29/737;H01L29/778;(IPC1-7):H01L31/032 主分类号 H01L29/812
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