发明名称 METHOD OF FORMING PHOTORESIST PATTERN, METHOD AND APPARATUS FOR FABRICATING LIQUID CRYSTAL DISPLAY INCLUDING PHOTORESIST PATTERN
摘要 PURPOSE: A method of forming a photoresist pattern, a method and an apparatus for fabricating a liquid crystal display including the photoresist pattern are provided to prevent the photoresist pattern from being deformed. CONSTITUTION: Photoresist is coated on a substrate(100). The photoresist is hardened(200). The substrate on which the photoresist is coated is cooled down inside an exposure chamber for exposing the photoresist(300). The photoresist is exposed(400). The photoresist is developed(500). In the step of cooling down the substrate, the substrate comes into contact with a metal plate for fixing the substrate. The metal plate corresponds to a transferring part for transferring the substrate. The transferring part has a temperature sensor for measuring the temperature of the substrate.
申请公布号 KR20020047646(A) 申请公布日期 2002.06.22
申请号 KR20000076142 申请日期 2000.12.13
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, GWANG GI;KIM, HAN GI;LEE, CHEOL U;PARK, SEONG U
分类号 G02F1/136;(IPC1-7):G02F1/136 主分类号 G02F1/136
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