发明名称 AMINE CONCENTRATION CONTROLLING APPARATUS AND METHOD FOR FORMING MICRO-PATTERN USING THE SAME
摘要 PURPOSE: An amine concentration controlling apparatus and a formation method of micro-pattern using the same is provided to improve a profile characteristic by performing an amine processing with a quantitative amine using an apparatus capable of artificially controlling an amine density. CONSTITUTION: An amine concentration controlling apparatus comprises a by-pass(60) located between an amine supply part and an amine chamber, a sensor(62) installed on one side of the by-pass(60) for measuring an amine density inserted from the amine supply part, a control panel(64) electrically connected to the sensor(62) for controlling the amine concentration measured from the sensor(62) after the comparison with a programmed amine density, and a valve(66) for controlling an exhausted volume supplied to the amine chamber by the control panel(64).
申请公布号 KR20020048270(A) 申请公布日期 2002.06.22
申请号 KR20000077711 申请日期 2000.12.18
申请人 HYNIX SEMICONDUCTOR INC. 发明人 KIM, JIN SU;KO, CHA WON
分类号 H01L21/027;(IPC1-7):H01L21/027 主分类号 H01L21/027
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