发明名称 FLUX CLEANING SYSTEM FOR SEMICONDUCTOR PACKAGE MANUFACTURING
摘要 PURPOSE: A flux cleaning system is provided to prevent a waste of a cleaning solution and a decrease of a cleaning property due to a contamination of a source water or a temperature decrease of a deionized water by improving the structure. CONSTITUTION: A flux cleaning system additionally comprises a heater(21) installed in a cleaning tank(5) for keeping a temperature of a deionized water to a constant temperature by heating the deionized water, a thermocouple(22) mounted on the heater(21) for detecting the temperature, a first sub-tank(12) connected to a first sub-drain pipe(24), a second sub-tank(13) connected to a second sub-drain pipe(25), and a connecting pipe(26) for connecting between the first sub-tank(12) and the second sub-tank(13). At this point, an optimal cleaning state is embodied by preventing a temperature change through the heater(21) and the thermocouple(22) and a contamination of a source water is reduced by the first and second sub-tanks(12,13).
申请公布号 KR20020047810(A) 申请公布日期 2002.06.22
申请号 KR20000076422 申请日期 2000.12.14
申请人 HYNIX SEMICONDUCTOR INC. 发明人 LEE, SU GWON
分类号 H01L23/00;(IPC1-7):H01L23/00 主分类号 H01L23/00
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