发明名称 SUBSTRAT POUR MATERIAU A INSOLER
摘要 The invention concerns a substrate (1) having a surface for receiving (4) a layer of material to be exposed by an insolation light, characterised in that the means forming mirror (3) are arranged between said reception surface (4) and the material to be exposed, said means forming mirror (3) operating for the wavelength of the insolation light. Such a substrate can be used for producing microelectronic, micro-technology devices or biochips.
申请公布号 FR2818263(A1) 申请公布日期 2002.06.21
申请号 FR20000016315 申请日期 2000.12.14
申请人 COMMISSARIAT A L'ENERGIE ATOMIQUE 发明人 POUTEAU PATRICK;CHATON PATRICK;PERRAUT FRANCOIS
分类号 G03F7/004;G02B1/10;G02B5/26;G03F7/09;G03F7/20 主分类号 G03F7/004
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