发明名称 |
SUBSTRAT POUR MATERIAU A INSOLER |
摘要 |
The invention concerns a substrate (1) having a surface for receiving (4) a layer of material to be exposed by an insolation light, characterised in that the means forming mirror (3) are arranged between said reception surface (4) and the material to be exposed, said means forming mirror (3) operating for the wavelength of the insolation light. Such a substrate can be used for producing microelectronic, micro-technology devices or biochips. |
申请公布号 |
FR2818263(A1) |
申请公布日期 |
2002.06.21 |
申请号 |
FR20000016315 |
申请日期 |
2000.12.14 |
申请人 |
COMMISSARIAT A L'ENERGIE ATOMIQUE |
发明人 |
POUTEAU PATRICK;CHATON PATRICK;PERRAUT FRANCOIS |
分类号 |
G03F7/004;G02B1/10;G02B5/26;G03F7/09;G03F7/20 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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