| 摘要 |
PROBLEM TO BE SOLVED: To provide an automated aligner which minimizes the causes of dust attachment by reducing the number of delivering substrates, and can invert the substrates, even without an inversion mechanism for special use for the purpose, and can be improved in throughput. SOLUTION: The automatic aligner 1 aligns a substrate W and a mask M and then exposes the substrate W to light via an optical system 50, to form a prescribed pattern on the substrate W. The automatic aligner 1 comprises a first holder unit 10, which consists of a plurality of first holder sections 11A-11D, disposed so as to face respectively, oppositely to the positions, where the substrate is received and where the substrate is exposed to light; a rotation driving means 18 for rotating the first holder unit and stopping the rotation of the unit; and a first exposure mechanism 20, disposed adjacent to the first holder unit. At least the first holder unit or the first exposure mechanism is provided with a first movement means 25 for moving the first holder sections or a first translucent plate in the abutting direction. |
