| 摘要 |
PURPOSE: A method for preparing a photomask, a photomask prepared by the method and a method for drawing the pattern by using the photomask are provided to improve the uniformity of shape and dimension in the pattern region, to reduce the face twisting and the spotting of a gray-tone mask for a LCD, and to reduce the size of drawing data. CONSTITUTION: The preparation method of a photomask comprises the step of drawing in specific scanning units in the scanning direction(Y direction) of the head of a drawing device and in specific delivery units in a direction(X direction) perpendicular to the scanning direction, wherein the pattern of the photomask contains a repetitive pattern and the drawing process contains a process drawing the each pattern unit under the each equal delivery condition to the pattern units containing the equal repetitive pattern. |
