LIQUID METAL VAPORIZATION UNIT FOR CVD SYSTEM, AND VAPORIZATION METHOD

摘要

PROBLEM TO BE SOLVED: To provide a vaporization unit for CVD system by which liquid metal of minute flow rate can be accurately controlled and supplied and a waste of expensive liquid-metal sources can be avoided and which can easily cope with the various liquid-metal sources having different characteristics and also to provide a vaporization method. SOLUTION: The liquid metal vaporization unit for CVD system has a liquid- metal flow-rate controller 40 and a vaporizer 50. In the flow-rate controller, a valve for opening and closing its flow passage can be controlled by both pulse width 40A and frequency 40B, and the liquid metal controlled by the flow-rate controller is introduced in the form of fine particles into the vaporizer.