发明名称 METHOD OF OXIDIZING MEMBER TO BE TREATED AND OXIDIZING EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To provide a method of oxidizing members to be treated, which can raise both the in-plane uniformity of an oxide film and the characteristics of the film quality of the oxide film while the oxidizing rate of the oxide film is highly maintained to a certain degree. SOLUTION: In a method of oxidizing members W to be treated for oxidizing the surfaces of the members W to be treated set at a prescribed temperature in a treating container 8 put under a vacuum atmosphere, the surfaces of the members W to be treated are oxidized using hydroxyl group active species and oxygen species as the main body of a catalyst. As a result, while the oxidizing rate of the oxide film is highly maintained to a certain degree, both the in-plane uniformity of the oxide film and the characteristics of the film quality of the oxide film are raised.
申请公布号 JP2002176052(A) 申请公布日期 2002.06.21
申请号 JP20010128350 申请日期 2001.04.25
申请人 TOKYO ELECTRON LTD 发明人 HASEBE KAZUHIDE;SATO SHOICHI;UMEZAWA KOUTAI
分类号 H01L21/31;H01L21/316;(IPC1-7):H01L21/316 主分类号 H01L21/31
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