| 摘要 |
PROBLEM TO BE SOLVED: To prevent generation of defective exposures caused by defocusing. SOLUTION: Taking into consideration of at least the size or the shape of an irradiated region of each measurement point on a substrate W to be irradiated with measurement light, a controller 20 selects measurement points to be used for the detection of the position of the substrate in the optical axis direction. Since only the measurement points whose irradiation region is within partition regions of the substrate are selected by the controller, a multi-point focusing position detection system (40, 42) uses only the selected measurement points to make accurate measurement of the position (and the slope) in the optical axis direction of the partition regions, where a mask pattern is to be transferred. When successively transferring the pattern of a mask R on those partition regions on the substrate via a projection optical system PL, by making accurate alignment of the partition regions on the substrate with the image surface of the projection optical system, based on the measurement results, defective exposures caused by defocusing can be prevented. |
