| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus and a method for depositing a thin film capable of separately depositing polymer film deposition materials on a substrate by a relatively simple constitution of facility, and improving the efficiency of utilizing the film deposition material. SOLUTION: In this thin film deposition apparatus, the solution 27 (or liquid material) containing the polymer material for film deposition is ultrasonic- oscillated and atomized, and deposited on the substrate 1. Mist 29 for film deposition by an ultrasonic vibration element 5 is generated, and the film is deposited on a substrate in a sealed space 21 of a chamber 3, and the solution 27 adhered to an inner wall of the sealed space 21 is lead to a solution pool 25 by gravity for recycling. A shutter 7 for separating the substrate 1 from vapor 29 until the concentration of the mist for film deposition reaches the saturated condition.
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