| 摘要 |
PURPOSE: A switching valve for equipment for fabricating a semiconductor is provided to prevent a defect of a semiconductor fabricating process, by controlling a flow rate of exhaustion according to a process characteristic of the semiconductor fabricating process. CONSTITUTION: A predetermined semiconductor fabricating process is performed in a process unit. An exhausting pipe exhausts remaining gas and disposal gas generated from the process unit. An exhausting gas flow control valve is installed in a predetermined position of the exhausting pipe. The first and second valve cases(310,320) of a valve case are coupled to each other. A hemispherical groove is formed on the inside surfaces of the valve case such that the inside surfaces confront each other. The portion of the valve case connected to the exhausting pipe is open. A spherical body is received in a space formed inside the first and second valve cases. The first and second penetrating holes form a predetermined angle, penetrating the diameter portion of the spherical body. The first pipe is coupled to the first penetrating hole. The second pipe penetrates the first pipe, coupled to the second penetrating hole. A penetrating hole for coupling a valve handle(330) is formed on the outer surface of one of the first or second valve case so that a portion corresponding to the rotation center of a ball valve(340) is seen from the outside. The valve handle rotates the ball valve, coupled to the penetrating hole for coupling the valve handle.
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