发明名称 CHARGED PARTICLE BEAM MICROSCOPE, CHARGED PARTICLE BEAM APPLICATION DEVICE, CHARGED PARTICLE BEAM MICROSCOPIC METHOD, CHARGED PARTICLE BEAM INSPECTING METHOD, AND ELECTRON MICROSCOPE
摘要 An electron microscope comprising a short-focus objective is used for capturing a favorable image with high resolution and free of distortion in a wide magnification range from low to high magnification during observation under low acceleration voltage condition. The distortion caused by the objective is canceled by the opposite distortion caused by a correction magnetic field lens for electron beam deflection, thereby forming a scanning electron microscope image with high resolution and no distortion in a wide magnification range from low magnification to high magnification.
申请公布号 WO0249066(A1) 申请公布日期 2002.06.20
申请号 WO2001JP10415 申请日期 2001.11.29
申请人 HITACHI, LTD.;NAKAMURA, KUNIYASU;KANDA, KIMIO;SATO, MITSUGU;ICHIHASHI, MIKIO;SHINADA, HIROYUKI;TSUNETA, RURIKO 发明人 NAKAMURA, KUNIYASU;KANDA, KIMIO;SATO, MITSUGU;ICHIHASHI, MIKIO;SHINADA, HIROYUKI;TSUNETA, RURIKO
分类号 G03F7/20;H01J37/141;H01J37/147;H01J37/153;H01J37/28;H01L21/027;(IPC1-7):H01J37/147;H01J37/22 主分类号 G03F7/20
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