发明名称 OSCILLATING SHOWER TRANSFER TYPE SUBSTRATE TREATMENT DEVICE
摘要 A transfer type substrate treatment device capable of efficiently removing air bubbles produced on the surface of a substrate when treatment fluid is fed to the surface of the substrate and eliminating the nonuniformity of a treatment rate in lateral direction causing a problem for a large substrate, wherein a large number of spray nozzles (34a) for feeding the treatment fluid onto the entire surface of the substrate (100) fed horizontally in a horizontal attitude are oscillated in synchronous with each other laterally in the forward moving direction of the substrate (100), whereby the flow of fluid from one side of the substrate (100) to the other side and the flow of the fluid from the other side to one side are forcibly formed alternately.
申请公布号 WO0249087(A1) 申请公布日期 2002.06.20
申请号 WO2001JP10766 申请日期 2001.12.07
申请人 SUMITOMO PRECISION PRODUCTS CO., LTD;SHIMODA, KYOJI;TAUCHI, HITOSHI 发明人 SHIMODA, KYOJI;TAUCHI, HITOSHI
分类号 H01L21/00;(IPC1-7):H01L21/306 主分类号 H01L21/00
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