发明名称 |
PLASMA PROCESSING APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To provide a plasma processing apparatus which is easy to control ion irradiation energy to a work, and plasma processing on the work is evenly performed at the time of plasma excitation by microwave. SOLUTION: A slot antenna plate 7 is disposed at the chamber inside 13 of a second dielectric 5 for irradiating microwave into the chamber inside 13. The antenna plate 7 comprises dielectric, and also has a slot 7a for inducing the microwave into the chamber inside 13. |
申请公布号 |
JP2002170818(A) |
申请公布日期 |
2002.06.14 |
申请号 |
JP20000368508 |
申请日期 |
2000.12.04 |
申请人 |
SHARP CORP;OMI TADAHIRO |
发明人 |
YAMAMOTO NAOKO;YAMAMOTO TATSUSHI;HIRAYAMA MASAKI;OMI TADAHIRO |
分类号 |
H05H1/46;C23F4/00;H01J37/32;H01L21/205;H01L21/302;H01L21/3065 |
主分类号 |
H05H1/46 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|