| 摘要 |
<p>The invention concerns a method for producing a thin film from a structure, comprising the following steps: (a) producing a stacked structure consisting of a first part designed to facilitate introduction of gaseous species and a second part, the second part including a first free surface and a second surface integral with the first part; (b) introducing gaseous species in the structure, from the first part so as to produce a cleavage zone, the thin film being thus delimited between the first surface of the second part and said cleavage zone; (c) separating the thin film from the rest of the structure at the cleavage zone.</p> |
