发明名称 Plating catalysts and electronic packaging substrates plated therewith
摘要 Disclosed are new catalysts for electroless metallization deposition, particularly catalysts that can be selectively activated and may be free of palladium and/or tin. Catalysts of the invention are preferably employed for electroless copper deposition.
申请公布号 US2002069788(A1) 申请公布日期 2002.06.13
申请号 US20010000865 申请日期 2001.10.24
申请人 SHIPLEY COMPANY, L.L.C. 发明人 GOOSEY MARTIN T.;BAINS NARINDER SINGH
分类号 C23C18/16;C23C18/28;(IPC1-7):C23C18/52;B05D3/10;B05D1/36 主分类号 C23C18/16
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