| 摘要 |
Reticles are provided for use in charged-particle-beam (CPB) microlithography, especially electron-beam microlithography. The reticle is configured as a segmented reticle of which the overall reticle size is reduced without compromising projection or stitching accuracy. A representative reticle includes a membrane that defines a pattern to be projection-transferred to a sensitive substrate, and support. struts that divide the membrane into multiple rectangular regions. Each rectangular region includes multiple subfields arranged longitudinally with intervening non-patterned regions. The width of the non-patterned regions is within the range of 1 mum to 50 mum. |
