发明名称 Nonvolatile semiconductor memory and process for fabricating the same
摘要 A nonvolatile semiconductor memory comprises a memory cell region including a number of memory cells formed therein and each having a floating gate and a control gate formed above the floating gate, a plurality of word lines extending in a first direction in parallel to each other, separately from each other, and a selection transistor region positioned adjacent to the memory cell region and including one selection transistor formed therein and a selection signal line extending in parallel to the word lines. The selection signal line is formed on an inactive region in a substrate to extend in parallel to a boundary line between the memory cell region and the selection transistor region.
申请公布号 US2002068402(A1) 申请公布日期 2002.06.06
申请号 US20020056015 申请日期 2002.01.28
申请人 NEC CORPORATION 发明人 NAKAGAWA KEN-ICHIRO
分类号 H01L21/8247;H01L27/105;H01L27/115;H01L29/788;H01L29/792;(IPC1-7):H01L21/336 主分类号 H01L21/8247
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