发明名称 Method and apparatus for control of semiconductor processing for reducing effects of environmental effects
摘要 The present invention provides for a method and an apparatus for reducing the effects of manufacturing environmental factors. At least one process run of semiconductor devices is processed. A manufacturing environmental data analysis is performed upon the process run of semiconductor devices. A control parameter modification sequence is implemented in response to the manufacturing environmental data analysis.
申请公布号 US2002069349(A1) 申请公布日期 2002.06.06
申请号 US20000729412 申请日期 2000.12.04
申请人 TOPRAC ANTHONY J. 发明人 TOPRAC ANTHONY J.
分类号 G05B13/02;G05B19/418;H01L21/00;(IPC1-7):G06F7/38;G06F9/00;G06F19/00;G06F9/44;G06F15/00 主分类号 G05B13/02
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