发明名称 |
Method and apparatus for control of semiconductor processing for reducing effects of environmental effects |
摘要 |
The present invention provides for a method and an apparatus for reducing the effects of manufacturing environmental factors. At least one process run of semiconductor devices is processed. A manufacturing environmental data analysis is performed upon the process run of semiconductor devices. A control parameter modification sequence is implemented in response to the manufacturing environmental data analysis.
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申请公布号 |
US2002069349(A1) |
申请公布日期 |
2002.06.06 |
申请号 |
US20000729412 |
申请日期 |
2000.12.04 |
申请人 |
TOPRAC ANTHONY J. |
发明人 |
TOPRAC ANTHONY J. |
分类号 |
G05B13/02;G05B19/418;H01L21/00;(IPC1-7):G06F7/38;G06F9/00;G06F19/00;G06F9/44;G06F15/00 |
主分类号 |
G05B13/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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