METHOD FOR CONTROLLING PLATING AMOUNT IN CONTINUOUS HOT DIPPING GALVANIZING PROCESS

摘要

PURPOSE: A method for controlling a plating amount in the continuous hot dipping galvanizing process is provided to prevent shortage of the plating amount or excessive plating and improve plating quality by synchronizing plating amount control modes with a plating amount measuring mode. CONSTITUTION: The method for controlling a plating amount in the continuous hot dipping galvanizing process comprises the steps of (a) performing a first feedback control by the time when data of strip changes(coil changes) are inputted from a main control unit(S61,S62); (b) setting a target plating amount by proceeding the step (a) if a preceding target plating amount included in result data is identical to a following target plating amount while changing a feedback control mode to a set control mode if the preceding target plating amount is not identical to the following target plating amount, and changing a measuring mode to a central part measuring mode at the same time(S63,S64); (c) performing a second feedback control by controlling a gap controlling motor and an air pressure control valve if a strip passes through a plating amount measuring instrument(S65,S66); and (d) proceeding the step (a) if working is not finished by performing the second feedback control of the step (c) when a plating amount measured from the plating amount measuring instrument is not included in a target plating amount range and changing the measuring mode into the scan measuring mode again when the plating amount measured from the plating amount measuring instrument is included in the target plating amount range(S67,S68).