POSITIVE RESIST COMPOSITION

摘要

PURPOSE: To provide a chemically amplifying positive resist composition of high resolution which is excellent in the resistance to dry etching and adhesion to a substrate, giving a good form of the resist pattern improved in line edge roughness. CONSTITUTION: The chemical amplifying positive resist composition includes (A) a resin component which is enhanced its solubility in an alkaline solution by the action of an acid, (B) an acid generating component which generates an acid by the exposure of a radiation and (C) an organic solvent. The composition of (A) is a poly(meth)acrylate of which (meth)acrylate units of the main chain containing a dissolution inhibiting group are at least partially replaced with esters induced from a (meth)acrylic acid and a lactone-ring containing bridged saturated polycyclic alcohol or those induced from a (meth)acrylic acid and a linear alcohol substituted with hydroxyl, alkoxyl or acyl groups.