发明名称 EVALUATION METHOD OF ANISOTROPIC THIN FILM AND ITS EQUIPMENT
摘要 PURPOSE: To provide an evaluation method of anisotropic thin film which can quickly measure the regulation degree and orientation of anisotropic thin film and can exactly evaluate the structure of anisotropic thin film. CONSTITUTION: The equipment of this invention has first detection process which irradiates first irradiation light, p polarized light against sample 9, to sample 9 and detects the strength of s polarized ingredient of first irradiation light reflecting on the plate of sample 9, second detection process which irradiates second irradiation light, p polarized light against sample 9, to sample 9 and detects the strength of s polarized ingredient of second irradiation light reflecting on the plate of sample 9, and evaluation process which decides the structure of thin film of sample 9 by operation of first and second strength distributions obtained by first and second detection processes. First and second processes are carried out at the same time.
申请公布号 KR20020040593(A) 申请公布日期 2002.05.30
申请号 KR20010072717 申请日期 2001.11.21
申请人 NEC CORPORATION;NIPPON LASER & ELECTRONICS LAB. 发明人 ITOH SATOSHI;TANOOKA DAISUKE
分类号 G01N21/21;G01N21/17;G01N21/41;G02F1/13;G02F1/1337;(IPC1-7):G01N21/17 主分类号 G01N21/21
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