发明名称 |
DRY ETCH EQUIPMENT FOR MANUFACTURING SEMICONDUCTOR DEVICES |
摘要 |
PURPOSE: A dry etch equipment is provided to prevent a particle and a gap due to a thinned angle controller by improving the structure of the angle controller of a gate. CONSTITUTION: A gate(120) comprises a plate(121), a connection part(140) and combining parts. The combining parts further include an angle controller(133) simultaneously connecting and controlling the combining angle between the plate(121) and the connection part(140) by connecting to fourth combining holes(145) on the connection part(140) through first combining holes(126), first fixing parts(131) connected to second combining holes(128) and a second fixing part connected to a third combining hole(143) on the connection part(140). At this time, the angle controller(133) further includes a head having a cylindric shape and a body having another cylindric shape including projected triangular pillars.
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申请公布号 |
KR20020039794(A) |
申请公布日期 |
2002.05.30 |
申请号 |
KR20000069607 |
申请日期 |
2000.11.22 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
JANG, DONG JUN |
分类号 |
H01L21/3065;(IPC1-7):H01L21/306 |
主分类号 |
H01L21/3065 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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