发明名称 |
OPENING/SHUTTING DEVICE OF RAPID THERMAL PROCESSING EQUIPMENT |
摘要 |
PURPOSE: An opening/shutting device of rapid thermal processing equipment is provided to prevent a sliding state of a wafer by controlling automatically an opening and shutting operation of a door. CONSTITUTION: The furnace(101) is used as a heating source for providing necessary heat to a processing space. A tube(102) formed with a quartz is arranged in an inner side of the furnace(101). A wafer tray(105) is arranged in an inside of the tube(102). The wafer tray(105) fixes and supports a wafer during a thermal process. A compression plate(103) and a door(104) are used for opening or shutting the processing space. An opening/shutting portion includes a luminous section(107) and a light receiving sensor(108). The luminous section(107) is arranged through a penetrating hole(106) of the compression plate(103). The luminous section(107) and the light receiving sensor(108) are connected with a control portion(109).
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申请公布号 |
KR20020040069(A) |
申请公布日期 |
2002.05.30 |
申请号 |
KR20000069984 |
申请日期 |
2000.11.23 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
CHO, SUN HYEONG;OH, JEONG SEOP |
分类号 |
H01L21/324;(IPC1-7):H01L21/324 |
主分类号 |
H01L21/324 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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