| 发明名称 |
METHOD FOR TREATING SUBSTRATES FOR MICROELECTRONICS |
| 摘要 |
The invention relates to a method for treating substrates ( 50 ) for microelectronics or optoelectronics, whereby said substrates comprise a useful layer ( 52 ) on at least one of the surfaces thereof. The inventive method includes a mechanical/chemical polishing step occurring on a bare surface ( 54 ) of the useful layer and is characterized in that it also comprises a post-curing step in a reductive atmosphere ( 100 ) before said polishing step occurs. |
| 申请公布号 |
EP1208589(A1) |
申请公布日期 |
2002.05.29 |
| 申请号 |
EP20000958696 |
申请日期 |
2000.08.17 |
| 申请人 |
S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES |
发明人 |
BARGE, THIERRY;AUBERTON-HERVE, ANDRE;AGA, HIROJI;TATE, NAOTO |
| 分类号 |
H01L21/02;H01L21/26;H01L21/304;H01L21/306;H01L21/324;H01L21/762;H01L27/12 |
主分类号 |
H01L21/02 |
| 代理机构 |
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代理人 |
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