| 摘要 |
PROBLEM TO BE SOLVED: To provide an interferometer for measuring, while avoiding increase in the size of a projection aligner. SOLUTION: A laser beam output from a continuous oscillation laser 1 is utilized for both exposure and measurement. The laser beam output from the laser 1 is directed toward a stigmatic optical system L via a semi-transmitting mirror 51 and a mirror 11. The interferometer has the system L, a projection optical system 3 and a reflecting member MR on a wafer stage 4, and interference fringes, reflecting a wavefront aberration of the system 3, is formed on a photoelectric converter 13.
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