| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a semiconductor device manufacturing flow management system and a method, capable of preventing malfunctions of a semiconductor device and damages to its manufacturing apparatus from being caused due to lack of knowledge or to oversight on the past of a creator of a manufacturing flow of a semiconductor device. SOLUTION: A shift rule, in which a shift between the processes of a manufacturing flow is recognized on the basis of category attribute, is determined and is applied to a manufacturing flow recording section that records information including a process device ID, the shift between the processes, and the category property to thereby limit and correct the shift between the desired processes. A sequence rule for judging whether the sequence between processes of the manufacturing flow or the existence of the process is recognized, on the basis of the category attribute is determined using a plurality of parameters that determine a starting process or the like and is applied to the manufacturing flow recording section, that records information including a process name and the process device ID, to thereby limit and correct the sequence between the desired processes.</p> |
