Half tone type phase shift mask blank manufacturing method for photolithography, involves implementing thermal treatment of translucent film at specified temperature

摘要

A thermal treatment of a translucent film is carried out at a 15 deg C after forming the translucent film on a transparent substrate. The translucent film has a thin film of nitrogen, metal and silicon as main components. Independent claims are included for the following: (1) Photo mask manufacturing method; (2) Pattern transcription method; (3) Mask blank; (4) Photo mask; (5) Method of manufacturing half tone type phase shaft mask; and (6) Half tone type shift mask.