发明名称 |
Method for producing circuit structures on a semiconductor substrate and semiconductor configuration with functional circuit structures and dummy circuit structures |
摘要 |
A method for producing circuit structures on a semiconductor substrate is described. Photoresist structures are formed, which define functional circuit structures and dummy circuit structures, whereby the dummy circuit structures which are smaller than a minimum structural size are joined to an additional second dummy circuit structure. The additional circuit structure is provided in such a way that the minimum structural size, which is determined by a smallest required joint surface of the photoresist on the substrate, is exceeded. A semiconductor circuit is also provided, which includes functional circuit structures and dummy circuit structures, the dummy circuit structures being joined to the additional dummy circuit structures.
|
申请公布号 |
US2002061614(A1) |
申请公布日期 |
2002.05.23 |
申请号 |
US20010981856 |
申请日期 |
2001.10.18 |
申请人 |
KLING SABINE;SAVIGNAC DOMINIQUE;MOLL HANS-PETER;HAFFNER HENNING;HIETSCHOLD ELKE;ANKE INES |
发明人 |
KLING SABINE;SAVIGNAC DOMINIQUE;MOLL HANS-PETER;HAFFNER HENNING;HIETSCHOLD ELKE;ANKE INES |
分类号 |
H01L21/768;H01L21/8242;H01L23/528;H01L27/02;H01L27/105;(IPC1-7):H01L21/338 |
主分类号 |
H01L21/768 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|