发明名称 Method for producing circuit structures on a semiconductor substrate and semiconductor configuration with functional circuit structures and dummy circuit structures
摘要 A method for producing circuit structures on a semiconductor substrate is described. Photoresist structures are formed, which define functional circuit structures and dummy circuit structures, whereby the dummy circuit structures which are smaller than a minimum structural size are joined to an additional second dummy circuit structure. The additional circuit structure is provided in such a way that the minimum structural size, which is determined by a smallest required joint surface of the photoresist on the substrate, is exceeded. A semiconductor circuit is also provided, which includes functional circuit structures and dummy circuit structures, the dummy circuit structures being joined to the additional dummy circuit structures.
申请公布号 US2002061614(A1) 申请公布日期 2002.05.23
申请号 US20010981856 申请日期 2001.10.18
申请人 KLING SABINE;SAVIGNAC DOMINIQUE;MOLL HANS-PETER;HAFFNER HENNING;HIETSCHOLD ELKE;ANKE INES 发明人 KLING SABINE;SAVIGNAC DOMINIQUE;MOLL HANS-PETER;HAFFNER HENNING;HIETSCHOLD ELKE;ANKE INES
分类号 H01L21/768;H01L21/8242;H01L23/528;H01L27/02;H01L27/105;(IPC1-7):H01L21/338 主分类号 H01L21/768
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