发明名称 |
WAFER INSPECTING METHOD, WAFER INSPECTING INSTRUMENT, AND ELECTRON BEAM APPARATUS |
摘要 |
A wafer inspecting instrument for inspecting a pattern formed on a wafer by irradiating the wafer with a charged particle beams. The wafer inspecting instrument comprises a charged particle beam generating means, a primary optical system including a means for irradiating a multi-aperture plate having a plurality of apertures with a charged particle beam generated from the beam generating means and for focusing a plurality of charged particle beams having passed through the apertures in the wafer surface, a secondary optical system which secondary charged particle beams radiated from the wafer enter, an electron beam apparatus including a detection system for detecting the secondary charged particle beam to output an electric signal and a processing control system for processing and evaluating the electric signal, a stage apparatus for holding and moving the wafer, and a working chamber which can be controlled to a desired atmosphere.
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申请公布号 |
WO0240980(A1) |
申请公布日期 |
2002.05.23 |
申请号 |
WO2001JP09627 |
申请日期 |
2001.11.02 |
申请人 |
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发明人 |
NAKASUJI, MAMORU;NOJI, NOBUHARU;SATAKE, TOHRU;HAMASHIMA, MUNEKI;KIMBA, TOSHIFUMI;HATAKEYAMA, MASAHIRO;WATANABE, KENJI;SOBUKAWA, HIROSI;KARIMATA, TSUTOMU;YOSHIKAWA, SHOJI;OOWADA, SHIN;SAITO, MUTSUMI |
分类号 |
G01N23/225;H01J37/06;H01J37/073;H01J37/18;H01J37/20;H01J37/22;H01J37/244;H01J37/28;(IPC1-7):G01N23/225 |
主分类号 |
G01N23/225 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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