ELECTRON BEAM EXPOSURE SYSTEM, ELECTRON BEAM CORRECTION METHOD, ELECTRON BEAM EXPOSURE METHOD, AND METHOD OF PRODUCING SEMICONDUCTOR ELEMENT

摘要

An electron beam exposure system for exposing wafers by electron beams, comprising a wafer-mounted wafer stage, a first electron beam generator for generating exposure electron beams to be applied onto wafers, a mark unit provided on an area other than a wafer-mounted area on the wafer stage, and a second electron beam generator for generating detection electron beams to be applied onto the mark unit.